Etching processes on a nanometric scale

For many diverse applications, such as in nanofluidics, it is necessary to obtain vertical etchings and with great dimensional control, with the goal of obtaining homogeneous devices that can be suitably sealed.

These etchings can be achieved using a combination of a SF6 plasma etchings with other plasmas. At Tekniker these kinds of 50 nm channels have been manufactured for their application to DNA stretching.